Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
Read more about Extreme Ultraviolet Lithography: EUVL Light Source, EUVL Optics, EUV-specific Overlay Issues, EUV Exposure of Photoresist, EUVL Defects, Unexpected Resolution Limits, EUVL Demonstrations, Timing Impact, Resource Requirements: EUV Vs. ArF Immersion Double Patterning
Famous quotes containing the words extreme and/or ultraviolet:
“Art knows no happier moment than the opportunity to show the symmetry of an extreme, during that moment of spheric harmony when the dissonance dissolves for the blink of an eye, dissolves into a blissful harmony, when the most extreme opposites, coming together from the greatest alienation, fleetingly touch with lips of the word and of love.”
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