Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
Read more about Extreme Ultraviolet Lithography: EUVL Light Source, EUVL Optics, EUV-specific Overlay Issues, EUV Exposure of Photoresist, EUVL Defects, Unexpected Resolution Limits, EUVL Demonstrations, Timing Impact, Resource Requirements: EUV Vs. ArF Immersion Double Patterning
Famous quotes containing the words extreme and/or ultraviolet:
“We are in a period when old questions are settled and the new are not yet brought forward. Extreme party action, if continued in such a time, would ruin the party. Moderation is its only chance. The party out of power gains by all partisan conduct of those in power.”
—Rutherford Birchard Hayes (1822–1893)
“As if the musicians did not so much play the little phrase as execute the rites required by it to appear, and they proceeded to the necessary incantations to obtain and prolong for a few instants the miracle of its evocation, Swann, who could no more see the phrase than if it belonged to an ultraviolet world ... Swann felt it as a presence, as a protective goddess and a confidante to his love, who to arrive to him ... had clothed the disguise of this sonorous appearance.”
—Marcel Proust (1871–1922)