Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
Read more about Extreme Ultraviolet Lithography: EUVL Light Source, EUVL Optics, EUV-specific Overlay Issues, EUV Exposure of Photoresist, EUVL Defects, Unexpected Resolution Limits, EUVL Demonstrations, Timing Impact, Resource Requirements: EUV Vs. ArF Immersion Double Patterning
Famous quotes containing the words extreme and/or ultraviolet:
“Individualism, pushed to anarchy, in the family is as ill- founded theoretically and as mischievous practically as it is in the State; while extreme regimentation is a certain means of either destroying self-reliance or of maddening to rebellion.”
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