Unexpected Resolution Limits
Given that EUV is a significant reduction in wavelength compared to current lithography wavelengths, one would expect significantly better resolution. However, the resolution is ultimately determined by the interaction volume in the image recording medium, i.e., the photoresist. As noted above, the low energy electrons released by EUV could blur the original EUV image. In addition, there are statistical effects, especially for feature areas less than 1500 square nanometers.
Read more about this topic: Extreme Ultraviolet Lithography
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