Resist
In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.
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Famous quotes containing the word resist:
“All the strong agonized men
Wear the hard clothes of war,
Try to remember what they are fighting for.
But in dark weeping helpless moments of peace
Women and poets believe and resist forever.”
—Muriel Rukeyser (19131980)
“Nobody can resist a ripe idea. The idea today is change.”
—Tansu Ciller (b. 1946)
“I love to weigh, to settle, to gravitate toward that which most strongly and rightfully attracts me;Mnot hang by the beam of the scale and try to weigh less,not suppose a case, but take the case that is; to travel the only path I can, and that on which no power can resist me. It affords me no satisfaction to commence to spring an arch before I have got a solid foundation.”
—Henry David Thoreau (18171862)