Resist
In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.
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Famous quotes containing the word resist:
“I love to weigh, to settle, to gravitate toward that which most strongly and rightfully attracts me;Mnot hang by the beam of the scale and try to weigh less,—not suppose a case, but take the case that is; to travel the only path I can, and that on which no power can resist me. It affords me no satisfaction to commence to spring an arch before I have got a solid foundation.”
—Henry David Thoreau (1817–1862)
“I can resist everything except temptation.”
—Oscar Wilde (1854–1900)
“I resist change even as I call for it.”
—Mason Cooley (b. 1927)