Temperature Control
One of the key challenges in rapid thermal processing is accurate measurement and control of the wafer temperature. Monitoring the ambient with a thermocouple has only recently become feasible, in that the high temperature ramp rates prevent the wafer from coming to thermal equilibrium with the process chamber. One temperature control strategy involves in situ pyrometry to effect real time control.Used for melting iron for welding purposes.
Read more about this topic: Rapid Thermal Processing
Famous quotes containing the words temperature and/or control:
“This pond never breaks up so soon as the others in this neighborhood, on account both of its greater depth and its having no stream passing through it to melt or wear away the ice.... It indicates better than any water hereabouts the absolute progress of the season, being least affected by transient changes of temperature. A severe cold of a few days’ duration in March may very much retard the opening of the former ponds, while the temperature of Walden increases almost uninterruptedly.”
—Henry David Thoreau (1817–1862)
“America is neither free nor brave, but a land of tight, iron- clanking little wills, everybody trying to put it over everybody else, and a land of men absolutely devoid of the real courage of trust, trust in life’s sacred spontaneity. They can’t trust life until they can control it.”
—D.H. (David Herbert)