Rapid Thermal Processing (or RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (up to 1,200 °C or greater) on a timescale of several seconds or less. During cooling, however, wafer temperatures must be brought down slowly so they do not break due to thermal shock. Such rapid heating rates are often attained by high intensity lamps or lasers. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.
Read more about Rapid Thermal Processing: Temperature Control, Rapid Thermal Anneal
Famous quotes containing the word rapid:
“It now appears that the negro race is, more than any other, susceptible of rapid civilization. The emancipation is observed, in the islands, to have wrought for the negro a benefit as sudden as when a thermometer is brought out of the shade into the sun. It has given him eyes and ears.”
—Ralph Waldo Emerson (1803–1882)