Photoresist - Some Common Photoresists

Some Common Photoresists

Dan Daly states that Shipley, acquired by Rohm and Haas, and Hoechst, now called AZ Electronic Materials, are two producers of microelectronic chemicals. Common products include Hoechst AZ 4620, Hoechst AZ 4562, Shipley 1400-17, Shipley 1400-27, Shipley 1400-37, and Shipley Microposit Developer. The resists mentioned are, generally, applied in a relatively thick layer—approximately 120 nm to 10 µm—and are used in the manufacture of microlens arrays. Microelectronic resists, presumably, utilize specialized products depending upon process objectives and design constraints. The general mechanism of exposure for these photoresists proceeds with the decomposition of diazoquinone, i.e. the evolution of nitrogen gas and the production of carbenes.