Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
Read more about Extreme Ultraviolet Lithography: EUVL Light Source, EUVL Optics, EUV-specific Overlay Issues, EUV Exposure of Photoresist, EUVL Defects, Unexpected Resolution Limits, EUVL Demonstrations, Timing Impact, Resource Requirements: EUV Vs. ArF Immersion Double Patterning
Famous quotes containing the words extreme and/or ultraviolet:
“One cannot be too extreme in dealing with social ills; the extreme thing is generally the true thing.”
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