Design Patent - Publication of Application

Publication of Application

In China, Canada, Japan, South Africa, and the United States, a design patent application is not published and is kept secret until granted.

In Brazil, the applicant can request that the application be kept in secrecy for a period of 180 days from the filing date. This will also delay the prosecution and granting of the application for 180 days.

In Japan, an applicant can request that a design be kept secret for a period of up 3 years after the registration has been granted.

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