Publication of Application
In China, Canada, Japan, South Africa, and the United States, a design patent application is not published and is kept secret until granted.
In Brazil, the applicant can request that the application be kept in secrecy for a period of 180 days from the filing date. This will also delay the prosecution and granting of the application for 180 days.
In Japan, an applicant can request that a design be kept secret for a period of up 3 years after the registration has been granted.
Read more about this topic: Design Patent
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—Herman Melville (1819–1891)
“An action is the perfection and publication of thought. A right action seems to fill the eye, and to be related to all nature.”
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—Jean Genet (1910–1986)