Techniques Comprising Computational Lithography
Computational lithography makes use of a number of numerical simulations to improve the performance (resolution and contrast) of cutting-edge photomasks. The combined techniques include Resolution Enhancement Technology (RET), Optical Proximity Correction (OPC), Source Mask Optimization (SMO), etc. The techniques vary in terms of their technical feasibility and engineering sensible-ness, resulting in the adoption of some and the continual R&D of others.
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