Pulsed Laser Deposition - Technical Aspects

Technical Aspects

There are many different arrangements to build a deposition chamber for PLD. The target material which is evaporated by the laser is normally found as a rotating disc attached to a support. However, it can also be sintered into a cylindrical rod with rotational motion and a translational up and down movement along its axis. This special configuration allows not only the utilization of a synchronized reactive gas pulse but also of a multicomponent target rod with which films of different multilayers can be created.

Some factors that influence the deposition rate:

  • Target material
  • Pulse energy of laser
  • Distance from target to substrate
  • Type of gas and pressure in chamber (oxygen, argon, etc.)

Read more about this topic:  Pulsed Laser Deposition

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