Multiple Patterning - Industrial Adoption

Industrial Adoption

At Semicon West 2012, Intel's support for multiple patterning with 193 nm immersion lithography was detailed. In a press release, Samsung also announced that its 14 nm FinFET development relied on working with partner Mentor to "deal with the complexities of multi-patterning lithography."

Read more about this topic:  Multiple Patterning

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