Interference Lithography - Basic Principle

Basic Principle

The basic principle is the same as in interferometry or holography. An interference pattern between two or more coherent light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima. Upon post-exposure photolithographic processing, a photoresist pattern corresponding to the periodic intensity pattern emerges.

For 2-beam interference, the fringe-to-fringe spacing or period is given by (λ/2)/sin(θ/2), where λ is the wavelength and θ is the angle between the two interfering waves. The minimum period achievable is then half the wavelength.

By using 3-beam interference, arrays with hexagonal symmetry can be generated, while with 4 beams, arrays with rectangular symmetry are generated. Hence, by superimposing different beam combinations, different patterns are made possible.

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