Photoresist - Photoresist Categories - Applications

Applications

  • Fabrication of printed circuit boards. This can be done by applying photoresist, exposing to the image, and then etching using iron chloride, cupric chloride or an alkaline ammonia etching solution to remove the copperclad substrate.
  • Sand carving. Sand blasting of materials is done after a photolithographically printed pattern has been applied as a mask.
  • Microelectronics This application, mainly applied to silicon wafers/silicon integrated circuits is the most developed of the technologies and the most specialized in the field.
  • Patterning and etching of substrates. This includes specialty photonics materials, MEMS, glass printed circuit boards, and other micropatterning tasks. Photoresist tends not to be etched by solutions with a pH greater than 3.

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