History
The term "Nanoimprint Lithography" (NIL) was coined in the scientific literature in 1996, when Prof. Stephen Chou and his students published a report in Science, although hot embossing (now taken as a synonym of NIL) of thermoplastics had been appearing in the patent literature for a few years already. Soon after the Science paper, many researchers developed many different variations and implementations. At this point, nanoimprint lithography has been added to the International Technology Roadmap for Semiconductors (ITRS) for the 32 and 22 nm nodes.
Read more about this topic: Nanoimprint Lithography
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