Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
Read more about Nanoimprint Lithography: History, Processes, Applications, Benefits, Concerns, Removal of Residual Layers, Proximity Effects, 3D-patterning, The Future of Nanoimprint