Electron Beam Physical Vapor Deposition or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber (within line of sight) with a thin layer of the anode material.
Read more about Electron Beam Physical Vapor Deposition: Introduction, Thin Film Deposition Process, Material Evaporation Methods, The Substrate, Ion Beam Assisted Deposition, Advantages of EBPVD, Disadvantages of EBPVD
Famous quotes containing the words beam and/or physical:
“It was at that moment, just after Krug had fallen through the bottom of a confused dream and sat up on the straw with a gasp—and just before his reality, his remembered hideous misfortune could pounce upon him—it was then that I felt a pang of pity for Adam and slid towards him along an inclined beam of pale light—causing instantaneous madness, but at least saving him from the senseless agony of his logical fate.”
—Vladimir Nabokov (1899–1977)
“When one walks, one is brought into touch first of all with the essential relations between one’s physical powers and the character of the country; one is compelled to see it as its natives do. Then every man one meets is an individual. One is no longer regarded by the whole population as an unapproachable and uninteresting animal to be cheated and robbed.”
—Aleister Crowley (1875–1947)