Electron Beam Physical Vapor Deposition or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber (within line of sight) with a thin layer of the anode material.
Read more about Electron Beam Physical Vapor Deposition: Introduction, Thin Film Deposition Process, Material Evaporation Methods, The Substrate, Ion Beam Assisted Deposition, Advantages of EBPVD, Disadvantages of EBPVD
Famous quotes containing the words beam and/or physical:
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—Bible: New Testament Jesus, in Matthew, 7:3.
From the Sermon on the Mount.
“Those things which now most engage the attention of men, as politics and the daily routine, are, it is true, vital functions of human society, but should be unconsciously performed, like the corresponding functions of the physical body.”
—Henry David Thoreau (1817–1862)