Under United States patent law, a continuing patent application is a patent application which follows, and claims priority to, an earlier filed patent application.
A continuing patent application may be one of three types: a continuation, divisional, or continuation-in-part application. While continuation and continuation-in-part applications are generally available in the U.S. only, divisional patent applications are also available in other countries, as such availability is required under Article 4G of the Paris Convention.
Read more about Continuing Patent Application: Early History, Current Law in The U.S., Controversy Around Attempted Changes By USPTO To Continuation Practice
Famous quotes containing the words continuing, patent and/or application:
“Perhaps the best definition of progress would be the continuing efforts of men and women to narrow the gap between the convenience of the powers that be and the unwritten charter.”
—Nadine Gordimer (b. 1923)
“There is a patent office at the seat of government of the universe, whose managers are as much interested in the dispersion of seeds as anybody at Washington can be, and their operations are infinitely more extensive and regular.”
—Henry David Thoreau (1817–1862)
“If you would be a favourite of your king, address yourself to his weaknesses. An application to his reason will seldom prove very successful.”
—Philip Dormer Stanhope, 4th Earl Chesterfield (1694–1773)