Photolithography - Experimental Methods

Experimental Methods

See also: Nanolithography

Photolithography has been defeating predictions of its demise for many years. For instance, by the early 1980s, many in the semiconductor industry had come to believe that features smaller than 1 micrometer could not be printed optically. Modern techniques using excimer laser lithography already print features with dimensions a fraction of the wavelength of light used - an amazing optical feat. New tricks such as immersion lithography, dual-tone resist and multiple patterning continue to improve the resolution of 193 nm lithography. Meanwhile, current research is exploring alternatives to conventional UV, such as electron beam lithography, X-ray lithography, extreme ultraviolet lithography and ion projection lithography.

Read more about this topic:  Photolithography

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