Advantages of EBPVD
The deposition rate in this process can be as low as 1 nm per minute to as high as few micrometers per minute. The material utilization efficiency is high relative to other methods and the process offers structural and morphological control of films. Due to the very high deposition rate, this process has potential industrial application for wear resistant and thermal barrier coatings in aerospace industries, hard coatings for cutting and tool industries, and electronic and optical films for semiconductor industries and thin film solar applications.
Read more about this topic: Electron Beam Physical Vapor Deposition
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