Electron Beam Lithography Systems
Electron beam lithography systems used in commercial applications are dedicated e-beam writing systems that are very expensive (>$4M USD). For research applications, it is very common to convert an electron microscope into an electron beam lithography system using a relatively low cost accessory ( Electron beam lithography systems can be classified according to both beam shape and beam deflection strategy. Older systems used Gaussian-shaped beams and scanned these beams in a raster fashion. Newer systems use shaped beams, which may be deflected to various positions in the writing field (this is also known as vector scan).
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