Typical Process
- Resist Deposition: The precursor solution is spin-coated on a clean (semiconductor) substrate, such as a silicon wafer, to form a very thin, uniform layer.
- Soft Bake: The layer is baked at a low temperature to evaporate residual solvent.
- Exposure: A latent image is formed in the resist e.g. (a) via exposure to ultraviolet light through a photomask with opaque and transparent regions or (b) by direct writing using a laser beam or electron beam.
- Development: Areas of the resist that have (or have not) been exposed are removed by rinsing with an appropriate solvent.
- Post-Exposure Bake
- Processing through the resist pattern: wet or dry etching, lift-off, doping...
- Resist Stripping
Read more about this topic: Resist
Famous quotes containing the words typical and/or process:
“Compare the history of the novel to that of rock ‘n’ roll. Both started out a minority taste, became a mass taste, and then splintered into several subgenres. Both have been the typical cultural expressions of classes and epochs. Both started out aggressively fighting for their share of attention, novels attacking the drama, the tract, and the poem, rock attacking jazz and pop and rolling over classical music.”
—W. T. Lhamon, U.S. educator, critic. “Material Differences,” Deliberate Speed: The Origins of a Cultural Style in the American 1950s, Smithsonian (1990)
“There was only one catch and that was Catch-22, which specified that a concern for one’s own safety in the face of dangers that were real and immediate was the process of a rational mind.... Orr would be crazy to fly more missions and sane if he didn’t, but if he was sane he had to fly them. If he flew them he was crazy and didn’t have to; but if he didn’t want to he was sane and had to.”
—Joseph Heller (b. 1923)