Typical Process
- Resist Deposition: The precursor solution is spin-coated on a clean (semiconductor) substrate, such as a silicon wafer, to form a very thin, uniform layer.
- Soft Bake: The layer is baked at a low temperature to evaporate residual solvent.
- Exposure: A latent image is formed in the resist e.g. (a) via exposure to ultraviolet light through a photomask with opaque and transparent regions or (b) by direct writing using a laser beam or electron beam.
- Development: Areas of the resist that have (or have not) been exposed are removed by rinsing with an appropriate solvent.
- Post-Exposure Bake
- Processing through the resist pattern: wet or dry etching, lift-off, doping...
- Resist Stripping
Read more about this topic: Resist
Famous quotes containing the words typical and/or process:
“Sinclair Lewis is the perfect example of the false sense of time of the newspaper world.... [ellipsis in source] He was always dominated by an artificial time when he wrote Main Street.... He did not create actual human beings at any time. That is what makes it newspaper. Sinclair Lewis is the typical newspaperman and everything he says is newspaper. The difference between a thinker and a newspaperman is that a thinker enters right into things, a newspaperman is superficial.”
—Gertrude Stein (1874–1946)
“We are in the process of creating what deserves to be called the idiot culture. Not an idiot sub-culture, which every society has bubbling beneath the surface and which can provide harmless fun; but the culture itself. For the first time, the weird and the stupid and the coarse are becoming our cultural norm, even our cultural ideal.”
—Carl Bernstein (b. 1944)