Process
The detailed mechanisms of PLD are very complex including the ablation process of the target material by the laser irradiation, the development of a plasma plume with high energetic ions, electrons as well as neutrals and the crystalline growth of the film itself on the heated substrate. The process of PLD can generally be divided into four stages:
- Laser ablation of the target material and creation of a plasma
- Dynamic of the plasma
- Deposition of the ablation material on the substrate
- Nucleation and growth of the film on the substrate surface
Each of these steps is crucial for the crystallinity, uniformity and stoichiometry of the resulting film.
Read more about this topic: Pulsed Laser Deposition
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