History
Pulsed laser deposition is only one of many thin film deposition techniques. Other methods include molecular beam epitaxy (MBE), chemical vapor deposition (CVD), sputter deposition (RF, Magnetron, and ion beam). The history of laser-assisted film growth started soon after the technical realization of the first laser in 1960 by Maiman. Smith and Turner utilized a ruby laser to deposit the first thin films in 1965, three years after Breech and Cross studied the laser-vaporization and excitation of atoms from solid surfaces. However, the deposited films were still inferior to those obtained by other techniques such as chemical vapor deposition and molecular beam epitaxy. In the early 1980s, a few research groups (mainly in the former USSR) achieved remarkable results on manufacturing of thin film structures utilizing laser technology. The breakthrough came in 1987 when Dijkkamp and Venkatesan were able to laser deposit a thin film of YBa2Cu3O7, a high temperature superconductive material, which was of more superior quality than films deposited with alternative techniques. Since then, the technique of Pulsed Laser Deposition has been utilized to fabricate high quality crystalline films. The deposition of ceramic oxides, nitride films, metallic multilayers and various superlattices has been demonstrated. In the 1990s the development of new laser technology, such as lasers with high repetition rate and short pulse durations, made PLD a very competitive tool for the growth of thin, well defined films with complex stoichiometry.
Read more about this topic: Pulsed Laser Deposition
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