Significance To Digital Electronics
In Very-Large-Scale Integration (VLSI) integrated circuit microprocessor design and semiconductor fabrication, a process corner represents a three or six sigma variation from nominal doping concentrations (and other parameters) in transistors on a silicon wafer. This variation can cause significant changes in the duty cycle and slew rate of digital signals, and can sometimes result in catastrophic failure of the entire system.
Variation may occur for many reasons, such as minor changes in the humidity or temperature changes in the clean-room when wafers are transported, or due to the position of the die relative to the center of the wafer.
Read more about this topic: Process Corners
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