Summary Table
| technique | single exposure resolution | max. mask defect height | max. mask defect size | throughput | issues |
|---|---|---|---|---|---|
| 193 nm 1.35 NA (current) | 40 nm | 34 nm | 80 nm | 130 WPH | water immersion |
| 193 nm 1.7 NA | 30 nm | 34 nm | 60 nm | TBD | high-index materials needed (possibly prohibitive) |
| 157 nm 1.7 NA | 25 nm | 24 nm | 50 nm | development stopped | lack of materials; CaF2 required to replace fused silica (prohibitive) |
| 13.5 nm 0.25 NA (EUVL) | ~ 30 nm (secondary electrons) | 0.4 nm (prohibitive) | 40 nm | 4 WPH (prohibitive) | ionization; shot noise; throughput; mask defects |
| X-ray proximity printing | ~ 30 nm (secondary electrons) | > 100 nm | depends on proximity gap; matches mask (possibly prohibitive) | comparable to optical | mask membrane (prohibitive); source (possibly prohibitive) |
| Nanoimprint | N/A (matches template) | residual layer thickness | 0 nm (prohibitive) | >1 WPH | bubble defects (possibly prohibitive); master template lithography (prohibitive if electron-beam); master template inspection |
| Electron beam | ~ 30 nm (secondary electrons) | N/A | N/A | case-dependent but prohibitively slow | charging; shot noise; interactions between parallel electrons |
| Charged particle projection | ~ 30 nm (secondary electrons) | case-dependent for scattering membrane; N/A for stencil | case-dependent for scattering membrane; N/A for stencil | trade-off with exposure current, i.e., resolution (prohibitive) | charging; contamination of stencil openings; double stencil exposure required for islands; mask membrane (prohibitive) |
While only high-index immersion (which strictly is more a proposed extension of photolithography than an NGL) does not immediately face prohibitive issues, future developments may uncover severe enough problems to prohibit their use. The complexities of next-generation lithography development have always spurred the pursuit of ways of extending the use of incumbent lithographic materials, light sources, and tools.
Read more about this topic: Next-generation Lithography
Famous quotes containing the words summary and/or table:
“Product of a myriad various minds and contending tongues, compact of obscure and minute association, a language has its own abundant and often recondite laws, in the habitual and summary recognition of which scholarship consists.”
—Walter Pater (1839–1894)
“But hospitality must be for service, and not for show, or it pulls down the host. The brave soul rates itself too high to value itself by the splendor of its table and draperies. It gives what it hath, and all it hath, but its own majesty can lend a better grace to bannocks and fair water than belong to city feasts.”
—Ralph Waldo Emerson (1803–1882)