Product Portfolio
The manufacturing processes KLA-Tencor’s tools affect include: chip manufacturing, wafer manufacturing, reticle manufacturing, data storage/media head manufacturing, high-brightness light emitting diode (HBLED) manufacturing, compound semiconductor manufacturing, MEMS manufacturing, and general purpose/labs.
KLA-Tencor’s core product selection includes inspection and metrology (measurement) tools for reticle, substrate and IC manufacturing.
Reticle Inspection - Error-free reticles and photomasks are the first step in achieving high yields, since reticle defects can be replicated on production wafers. Mask shops and IC fabs rely on KLA-Tencor’s high-sensitivity reticle inspection systems to ensure that masks are defect-free when they are shipped to the fab, and that they remain defect-free during the fabrication process.
Wafer Inspection - KLA-Tencor’s wafer inspection product line can be further divided into patterned wafer, monitor wafer and bare substrate inspection. Patterned wafer defect inspection, review and analysis tools allow engineers to detect, count, classify and characterize yield failures caused by particles, pattern defects and electrical issues during all stages of the chip manufacturing process. Monitor-wafer and bare-substrate defect inspection include specialized tools used to detect, count and bin defects, then assess surface quality on blanket (unpatterned) films and bare substrate surfaces for process and tool qualification and monitoring.
Metrology - KLA-Tencor’s metrology solutions address integrated-circuit, substrate, medical device manufacturing, as well as scientific research and other applications. Precise metrology and control of surface topography and electro-optical properties are growing in importance in many industries as critical dimensions narrow, film thicknesses shrink to countable numbers of atomic layers and devices become more complex. KLA-Tencor’s metrology systems are manufactured and developed in the company's plant in Migdal HaEmek, Israel.
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