Materials and Precursors
The range of materials deposited by EBID currently (sept. 2008) includes Al, Au, amorphous carbon, diamond, Co, Cr, Cu, Fe, GaAs, GaN, Ge, Mo, Nb, Ni, Os, Pd, Pt, Rh, Ru, Re, Si, Si3N4, SiOx, TiOx, W, and is being expanded. The limiting factor is availability of appropriate precursors, gaseous or having low sublimation temperature.
The most popular precursors for deposition of elemental solids are metal carbonyls of Me(CO)x structure or metallocenes. They are easily available, but produce carbon contamination. Metal-halogen complexes (WF6, etc.) result in cleaner deposition, but they are toxic and corrosive. Compound materials are deposited from specially crafted, exotic gases, e.g. D2GaN3 for GaN.
Read more about this topic: Electron Beam-induced Deposition
Famous quotes containing the words materials and and/or materials:
“Young children learn in a different manner from that of older children and adults, yet we can teach them many things if we adapt our materials and mode of instruction to their level of ability. But we miseducate young children when we assume that their learning abilities are comparable to those of older children and that they can be taught with materials and with the same instructional procedures appropriate to school-age children.”
—David Elkind (20th century)
“Artists, whatever their medium, make selections from the abounding materials of life, and organize these selections into works that are under the control of the artist.... In relation to the inclusiveness and literally endless intricacy of life, art is arbitrary, symbolic and abstracted. That is its value and the source of its own kind of order and coherence.”
—Jane Jacobs (b. 1916)