Electron Beam-induced Deposition - Advantages

Advantages

  • Deposition occurs in high-vacuum chamber of electron microscope and therefore is rather clean.
  • Size of the produced structures and accuracy of deposition are unprecedented.
  • The deposited material can be characterized using the electron microscopy techniques (TEM, EELS, EDS, electron diffraction) during or right after deposition. In situ electrical and optical characterization is also possible.

Read more about this topic:  Electron Beam-induced Deposition

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