Electron Beam-induced Deposition - Advantages

Advantages

  • Deposition occurs in high-vacuum chamber of electron microscope and therefore is rather clean.
  • Size of the produced structures and accuracy of deposition are unprecedented.
  • The deposited material can be characterized using the electron microscopy techniques (TEM, EELS, EDS, electron diffraction) during or right after deposition. In situ electrical and optical characterization is also possible.

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