Application
Shallow trench isolation (STI), a process used to fabricate semiconductor devices, is a technique used to enhance the isolation between devices and active areas. Moreover, STI has a higher degree of planarity making it essential in photolithographic applications, depth of focus budget by decreasing minimum line width. To planarize shallow trenches, a common method should be used such as the combination of resist etching-back (REB) and chemical mechanical polishing (CMP). This process comes in a sequence pattern as follows. First, the isolation trench pattern is transferred to the silicon wafer. Oxide is deposited on the wafer in the shape of trenches. A photo mask, composed of silicon nitride, is patterned on the top of this sacrificial oxide. A second layer is added to the wafer to create a planar surface. After that, the silicon is thermally oxidized, so the oxide grows in regions where there is no Si3N4 and the growth is between 0.5 and 1.0 µm thick. Since the oxidizing species such as water or oxygen are unable to diffuse through the mask, the nitride prevents the oxidation. Next, the etching process is used to etch the wafer and leave a small amount of oxide in the active areas. In the end, CMP is used to polish the SiO2 overburden with an oxide on the active area.
Read more about this topic: Chemical-mechanical Planarization
Famous quotes containing the word application:
“Most people, no doubt, when they espouse human rights, make their own mental reservations about the proper application of the word “human.””
—Suzanne Lafollette (1893–1983)
“We will not be imposed upon by this vast application of forces. We believe that most things will have to be accomplished still by the application called Industry. We are rather pleased, after all, to consider the small private, but both constant and accumulated, force which stands behind every spade in the field. This it is that makes the valleys shine, and the deserts really bloom.”
—Henry David Thoreau (1817–1862)
“The best political economy is the care and culture of men; for, in these crises, all are ruined except such as are proper individuals, capable of thought, and of new choice and the application of their talent to new labor.”
—Ralph Waldo Emerson (1803–1882)