Further Reading
- sst.pennnet.com
Kinam Kim, "Technology for sub-50nm DRAM and NAND flash manufacturing," Electron Devices Meeting, 2005. IEDM Technical Digest, pp. 323– 326.
Sanghun Jeon, et al. "High work-function metal gate and high-κ dielectrics for charge trap flash memory device applications," IEEE Trans. Elect. Dev., vol. 52 no. 12, pp. 2654–2659, Dec. 2005.
Read more about this topic: Charge Trap Flash
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