Example: Elpida 90 Nm DDR2 SDRAM Process
- Use of 300 mm wafer size
- Use of KrF (248 nm) lithography with optical proximity correction
- 512 Mbit
- 1.8 V operation
- Derivative of earlier 110 nm and 100 nm processes
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“The a priori method is distinguished for its comfortable conclusions. It is the nature of the process to adopt whatever belief we are inclined to, and there are certain flatteries to the vanity of man which we all believe by nature, until we are awakened from our pleasing dream by rough facts.”
—Charles Sanders Peirce (18391914)