45 Nanometer - High-k Dielectrics

High-k Dielectrics

Chipmakers have initially voiced concerns about introducing new high-k materials into the gate stack, for the purpose of reducing leakage current density. As of 2007, however, both IBM and Intel have announced that they have high-k dielectric and metal gate solutions, which Intel considers to be a fundamental change in transistor design. NEC has also put high-k materials into production.